New proximity effect correction for under 100nm patternsSHOJI, Masahiro; HORIUCHI, Nobuyasu; CHIKANAGA, Tomoyuki et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6194-6, 2Vol, VOL 2,615128.1-615128.10Conference Paper

Observation of a novel, inelastic, charge-imbalance relaxation process in superconductor-insulator-normal-metal tunnel junctionsLEMBERGER, T. R; YEN, Y.Physical review. B, Condensed matter. 1984, Vol 29, Num 11, pp 6384-6386, issn 0163-1829Article

Proximity effect sandwiches containing local spin fluctuationsTANG, I. M; ROONGKEADSAKOON, S.Journal of low temperature physics. 1984, Vol 56, Num 5-6, pp 441-460, issn 0022-2291Article

Scanner-dependent Optical Proximity EffectsTYMINSKI, Jacek K; MATSUYAMA, Tomoyuki; NAKASHIMA, Toshiharu et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7274, issn 0277-786X, isbn 978-0-8194-7527-5 0-8194-7527-0, 72740U.1-72740U.9, 2Conference Paper

Etude des phénomènes physiques limitant les transerts d'images en lithographie optique submicronique = Study of physical phenomena limiting image transfers in submicron optical lithographyFestes, Gilles; Portal, Jean-Claude.1992, 217 p.Thesis

Enhancing the rules for optical proximity correction to improve process latitudeMARTIN, Brian; ARTHUR, Graham.SPIE proceedings series. 2001, pp 631-636, isbn 0-8194-4030-2Conference Paper

Proton beam writing of three-dimensional nanostructures in hydrogen silsesquioxaneVAN KAN, Jeroen A; BETTIOL, Andrew A; WATT, Frank et al.Nano letters (Print). 2006, Vol 6, Num 3, pp 579-582, issn 1530-6984, 4 p.Article

Fluctuation paraconductivity in superconducting multilead structures above the transition temperatureTAKANE, Yositake.Journal of the Physical Society of Japan. 2001, Vol 70, Num 2, pp 498-504, issn 0031-9015Article

Les effets de proximité en microlithographie : caractérisation et étude des méthodes de correction = Proximity effects in microlithography : characterization and evaluation of the correction strategiesToublan, Olivier; Guillemot, Nadine.1999, 190 p.Thesis

Strategy to manipulate the optical proximity effect by post-exposure bake processingGAU, T.-S; WANG, C.-M; DAI, C.-M et al.SPIE proceedings series. 1998, pp 885-891, isbn 0-8194-2779-9Conference Paper

Proximity effect reduction in x-ray mask making using thin silicon dioxide layersRHEE, K. W; MA, D. I; PECKERAR, M. C et al.Journal of vacuum science & technology. B. Microelectronics and nanometer structures. Processing, measurement and phenomena. 1992, Vol 10, Num 6, pp 3062-3066, issn 1071-1023Conference Paper

Expanding the process window and reducing the optical proximity effect by post-exposure delayKU, Chin-Yu; SHIEH, Jia-Min; CHIOU, Tsann-Bim et al.Journal of the Electrochemical Society. 2001, Vol 148, Num 8, pp G434-G438, issn 0013-4651Article

Multiwire shielded cable parameter computationKANE, M; AHMAD, A; AURIOL, P et al.IEEE transactions on magnetics. 1995, Vol 31, Num 3, pp 1646-1649, issn 0018-9464, 1Conference Paper

Critical currents and superconducting boundary effects in S-N-S multifilamentary compositesSUMPTION, M. D; TAKACS, S; COLLINGS, E. W et al.Advances in cryogenic engineering. 1998, Vol 44, pp 843-850, issn 0065-2482, BConference Paper

Proximity effects on the ground fault current distribution within the earthing system formed by a substation and the associated transmission linesNAHMAN, J. M.IEE proceedings. Part C. Generation, transmission and distribution. 1988, Vol 135, Num 6, pp 497-502, issn 0143-7046Article

A new method for correcting proximity and fogging effects by using the EID model of variable shaped beam for 65- nm nodePARK, Eui-Sang; CHO, Hyun-Joon; KIM, Jin-Min et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-5853-8, 2Vol, Part 1, 58-65Conference Paper

Flexible sparse and dense OPC algorithmsCOBB, Nick.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-5853-8, 2Vol, Part 2, 693-702Conference Paper

A flexible and efficient approach to E-beam proximity effect correction - PYRAMIDLEE, Soo-Young.Surface and interface analysis. 2005, Vol 37, Num 11, pp 919-926, issn 0142-2421, 8 p.Conference Paper

Influence of underlayer reflection on optical proximity effects in sub-quarter micron lithographySEKIGUCHI, A; UESAWA, F; TAKEUCHI, K et al.SPIE proceedings series. 1998, pp 347-355, isbn 0-8194-2779-9Conference Paper

Optical proximity correction : A detail comparison of techniques and their effectivenessZHANG, H; MORROW, J; SCHELLENBERG, F. M et al.Microelectronic engineering. 1998, Vol 41-42, pp 79-82, issn 0167-9317Conference Paper

PROXIMITY EFFECT IN ELECTRON-BEAM LITHOGRAPHY.CHANG THP.1975; J. VACUUM SCI. TECHNOL.; U.S.A.; DA. 1975; VOL. 12; NO 6; PP. 1271-1275; BIBL. 6 REF.; (SYMP. ELECTRON ION PHOTON BEAM TECHNOL. 13. PROC.; COLORADO SPRINGS; 1975)Conference Paper

EFFET DE PROXIMITE DANS LES SYSTEMES SUPRACONDUCTEURS A TROIS COUCHESGORBONOSOV AE.1972; FIZ. METALLOV METALLOVED.; S.S.S.R.; DA. 1972; VOL. 34; NO 4; PP. 714-723; BIBL. 8 REF.Serial Issue

GAP MEASUREMENT IN PROXIMITY REPLICATION SYSTEMSFROSCH A; MANNSDOERFER W; SCHEUING C et al.1977; COLLOQUE INTERNATIONAL SUR LA MICROLITHOGRAPHIE, MICROELECTRONIQUE, OPTIQUE; FRA; DA. 1977; DGRST-7771946; PP. 125Conference Paper

COHERENT EFFECTS IN LARGE ARRAYS OF SUPERCONDUCTING BRIDGES.PALMER DW; MER CEREAU JE.1974; APPL. PHYS. LETTERS; U.S.A.; DA. 1974; VOL. 25; NO 8; PP. 467-469; BIBL. 8 REF.Article

STUDY OF SUPERCONDUCTING TIN-LEAD PROXIMITY SANDWICH BY JOSEPHSON TUNNELING.ROMAGNAN JP; GILABERT A; NOIRAY JC et al.1974; SOLID STATE COMMUNIC.; G.B.; DA. 1974; VOL. 14; NO 1; PP. 83-86; ABS. FR.; BIBL. 15 REF.Article